TFDS-462B LOAD LOCK

TFDS-462B D-shape box chamber High Vacuum Thin Film Deposition System customized to your needs. System designed and built per customer specifications.

Suitable for most of the known devices and technologies such as:

Thermal evaporation
Electron beam
Ion beam
Ion beam assisted evaporation
Ion beam cleaning
Glow discharge cleaning
Sputtering, etc

The system is especially designed having in mind the benefits of the load lock and to prolong the working time before chamber need to be open for service:

Dual or multi-crystal
Larger size crucibles
Possibility to add evaporation material without braking vacuum
Window shutters, etc

Load lock allows fast cycling with several runs per day.Special cleaning, annealing, oxidation, surface activation using IR heating, UV plasma, Ion bombardment, etc can be added.

Several optional substrate holders available: