ALD 300 – Thermal Atomic Layer Deposition

Compact Atomic Layer Deposition System – Thermal

Thermal-based ALD systems
4”-8” wafer holder with substrate heating
2-6 precursors , 2-6 gas lines
Flexible design for any purpose, solar-cells, display-panels, semiconductors, MEMS, etc.
Special sample design for powder coating
PC/PLC Control with Touch-screen HMI
Operation modes – manual, automatic, programming
Option for glovebox integration

Other Products We Offer

MLD-340

ALD 320 – Plasma Atomic Layer Deposition

ALD 330 – Atomic Layer Deposition for Powders

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vti-glovebox

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