ALD 330 – Atomic Layer Deposition for Powders

Atomic Layer Deposition System for Powders

Compact dual purpose ALD system
Pulsed-bed thermal stop-flow reactor for small powder quantities
Second thermal/plasma reactor for small wafers
Removable container for dust and powders with a set of filters for different powders
2-6 precursors , 2-4 gas lines
Flexible design for any purpose
Fully automated PC/PLC control with Touch-screen HMI

Other Products We Offer

MLD-340

ALD 320 – Plasma Atomic Layer Deposition

ALD 300 – Thermal Atomic Layer Deposition

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